Magnetron sputter deposition systems which contain three to four magnetron sputter sources that will be used for research and development of superconducting devices. All system shall be a sputter-up configuration with sources in a con-focal arrangement. All system shall include a load-lock chamber and will have substrate surface cleaning capabilities on a rotating water-cooled main chamber sample stage. One system shall have controlled oxygen dosing in the load lock.These systems shall provide for computer automation of deposition steps using a recipe system.

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