Due to increasing demand for wafer-scale characterization in the CNST NanoFab, NIST has a need for an AFM/SPM that has the capability to perform non-destructive, nanoscale surface topography and related measurements at several sites across a 200 mm-diameter wafer as rapidly as possible. (The maximum probe velocity is expected to be a key evaluation factor in the procurement.)

The wafer scale AFM/SPM will be sited in a class 100 cleanroom and it will be used as a shared resource in the CNST NanoFab, accessible to researchers from industry, academia, NIST, and other government agencies. Users will range in experience from AFM/SPM novices to experts in the field. The wafer scale AFM/SPM will be utilized to investigate a wide range of materials and nanostructures. High-resolution, high speed imaging and analysis of surface topography and other surface properties will be required.

After results of this market research are obtained and analyzed and specifications are developed for the wafer scale AFM/SPM, NIST may conduct a competitive procurement and subsequently award a purchase order.