BACKGROUND
Semiconductor manufacturing yield enhancement requires ongoing risk analysis of cleaning chemical purity wherein critical contaminants are already at levels difficult or impossible to detect, let alone identify and quantify. Next generation chips will require even purer materials and advanced metrological capabilities for the detection, identification, and quantification of impurities in semiconductor cleaning chemicals necessitating a practical roadmap for assessing material purity commensurate with the needs of the next generation in semiconductor manufacturing. The International Roadmap for Devices and Systems (IRDS) has identified that a “Lack of proven particle metrology limits the ability to confirm whether UF (ultrafiltration of UPW) is effective in controlling killer size particles down to the critical particle size”.
Aerosol-based testing of UF will require nebulizing and drying a ultra-pure water (UPW) stream to form an aerosol and simultaneously measuring the upstream and downstream particle size distributions and number densities. This aerosolization process directly mimics what occurs on-wafer. These aerosol-based methods are quickly gaining acceptance and NIST research would speed these efforts.
Specifically, we require two nanoparticle nebulizers that can generate, from water, ultrafine native particles (those existing at or near their actual size in water) with sizes < 10 nm and minimizes the effect of non-volatile particle precursors (materials that form particles upon aerosolization and drying).
The nanoparticle nebulizers will be used in a standard indoor chemistry laboratory with temperatures between 18 °C and 24 °C and relative humidities between 20 % and 80 % (non-condensing) and standard 120 V 20 A/30A power.
The nanoparticle nebulizers serve as components in a larger system designed to measure the efficiency of a laboratory-scale UF system that has been configured for the quantitative determination of UF efficiency to particles with sizes spanning ≈ 1 nm to ≈ 50 nm and a range of chemistries and morphologies (e.g., spherical, rod, etc.). Ideally, the nanoparticle nebulizers can generate particles from cleaning chemicals such as isopropyl alcohol, hydrogen peroxide, ammonia, and dilute hydrochloric acid where UF is needed.
NIST is seeking information from sources that may be capable of providing a commercial solution that will achieve the objectives described above. In addition to the above, below are additional line-item descriptions that includes specifics on essential requirements:
Line Item 0001: Nanoparticle nebulizer
Description: Particle generator that minimizes interference from non-volatile particle precursors.
Quantity: 2
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