Responses to this RFI are not quotes on which an order will be issued. The Government does not intend to award an order based solely on responses to this RFI. Further, the Government makes no commitment to issue an RFQ or make award or award in response to this RFI. The Government will not reimburse any costs associated with the development and submission of material in response to this request for information (RFI). However, should such a requirement materialize, no basis for claims against NRL shall arise as a result of a response to this RFI or NRL's use of such information either as part of our evaluation process or in developing specifications or work statements for any subsequent requirement.

Objective:
The Naval Research Laboratory (NRL) is searching for potential sources capable of performing the requirements set forth in the attached draft Specifications entitled "Maskless Aligner Salient Characteristics & Installation".

The intent of this RFI is to:
Search for potential sources capable of fulfilling a requirement for a research grade maskless aligner photolithography system for semiconductor device patterning and fabrication.

NRL asks that interested parties, at a minimum, supply the following information:

a) Name of Company and Point of Contact (POC)
b) Capabilities Statement
c) A list of contracts or task orders that are similar to that required under the attached Specification
c) Questions for the Technical team regarding changes/suggestions to the draft Specification to add clarity. (Questions will not receive a response but will be provided to the technical team for consideration in preparing the final specification.)