NASA/GRC intends to purchase the items from Biotronics, Inc. The experiment calls for the investigation of several gases for etching silicon carbide. Biotronics, Inc. have demonstrated that it has access to these gases (BCl3, HBr, Cl2, and Argon) and the reactive ion etching tools required to successfully perform the experiments. Specifications: 1) BCI3 only etching. Fixed RIE Power = 100 W + reflected power; 2) HBr+Ar (fixed at 20 sccm) etching. Fixed RIE Power = 100 W + reflected power. 3)BC13+C12 (fixed at 5 sccm) + Ar (fixed at 20 sccm) Etching. Fixed RIE Power = reflected power. These gases cannot be processed in-house due to the time consuming equipment reconfiguration and safety logistics that must be performed. Based on our previous research interaction and having performed extensive deep reactive ion etching services for NASA/GRC, Biotronics, Inc. have demonstrated capability to deliver the required services.

The Government intends to acquire a commercial item using FAR Part 12 and Part 13, Simplified Acquisition Procedures.

The sole source is under the authority of FAR Reference 13.106-1(b)1(i)

Interested organizations may submit their capabilities and qualifications to perform the effort in writing to the identified point of contact not later than 4:30 p.m. local time on July 15, 2014. Such capabilities/qualifications will be evaluated solely for the purpose of determining whether or not to conduct this procurement on a competitive basis. A determination by the Government not to compete this proposed effort on a full and open competition basis, based upon responses to this notice, is solely within the discretion of the government.

Oral communications are not acceptable in response to this notice.

All responsible sources may submit an offer which shall be considered by the agency.

NASA Clause 1852.215-84, Ombudsman, is applicable. The Center Ombudsman for this acquisition can be found at http://prod.nais.nasa.gov/pub/p ub_library/Omb.html .