Argonne National Laboratory is seeking a Fiji Gen 2 Plasma ALD System with the following critical features: 

• Capable of deposition on 200 mm wafers.
• Can deposit high quality superconducting nitrides that have the following critical properties: (1) Low resistivity: (p(µOhm.cm) <= 100 for TiN and <= 200 for NbN), and (2) Superconductivity as deposited with a high transition temperature: Tc >= 3.8K for TiN and >= 13.8K for NbN. 
• Remote plasma source with working distance of >25cm from substrate to enable ion-rich and radical rich conditions.
• Hot wall reactor with ability to integrate in-situ diagnostics such as ellipsometry, QCM and/or residual gas analyzer(RGA)/mass spectrometer(MS). Walltemperature of the reactor must be able to be independently controlled up to 300°C.
• System must have a single input into the chamber for precursors in order to maintain the shortest path length into the reactor; precursor inputs must be via a 3-way ALD valve, constantly purged with inert gas and manifolded into a single input point into the reactor.
• The plasma source must not require water cooling for the automatching network. A Seren RF power supply and matching network is strongly preferred.
• For minimized gas consumption the standard, recommended idle consumption of the system must be less than 60 sccm total gas flow of Ar/N2.

Please provide the below no later than the offer deadline: 

1. Completed and signed ANL-70 Request for Quotation (OK to include technical specifications on a separate proposal)

2. Completed and signed ANL-70B Pre-Award Information 

3. Price justification as stated in ANL-70 Request for Quotation document

4. Country of Origin confirmation