Iowa State University of Science and Technology (ISU) is requesting bids to provide and install a deep reactive ion etcher for the Microelectronics Research Center per the specifications. This deep reactive ion etcher will be used by researchers and students to create high aspect ratio microstructures in silicon wafers/substrates in microelectromechanical systems, sensors, and microfluidics research. Prior to award of any contract, ISU reserves the right to request demonstration of the system(s) and/or sample runs in order to verify the proposed system will be acceptable to the University. Contractors should read all materials carefully and note the due dates. Contractors must direct all questions and comments in reference to this RFP/RFQ under the "Questions" tab.

Bid Protests Not Available